Experimental setup
Base pressure - 10-8 mbar
Liquid Helium cryostat T is
controlled with a Si diod
Sample deposition from the gas phase:
Variable thickness 100 – 10000 nm
Variable film structure
Open sample surface
Luminescence is recorded simultaneously in VUV and visible range
Can be measured not only total yield of TSL, but also spectrally resolved TSL yields in VUV and visible ranges
Optical and current relaxation emission e.g. TSL, OSL and TSEE, OSEE as well as pressure in the chamber are detected simultaneously