Optical identification using imperfections in 2D materials

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Introduction The ability to uniquely identify an object or device is

Introduction

The ability to uniquely identify an object or device is important

for authentication. Imperfections, locked into structures during fabrication, can be used to provide a fingerprint that is challenging to reproduce.
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Objective To analise a proposed simple optical technique to read unique

Objective

To analise a proposed simple optical technique to read unique information from

nanometer-scale defects in 2D materials. 
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Tasks Method Results for WS2 from mechanically exfoliation Results for WS2 from chemical vapor deposition Conclusion

Tasks

Method
Results for WS2 from mechanically exfoliation
Results for WS2 from chemical vapor

deposition
Conclusion
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Method Measurement apparatus, in which the photoluminescence from a monolayer TMD

Method

Measurement apparatus, in which the photoluminescence from a monolayer TMD is

collected by an objective lens (OL), selectively transmitted through a rotatable optical bandpass filter (BPF), finally imaged on a CCD sensor. 
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Angular orientations of the BPF determines the center-wavelength of its pass

Angular orientations of the BPF determines the center-wavelength of its pass

band, which varies with incidence angle
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Concept of the angular selective transmission Changing the BPF angle lights

Concept of the angular selective transmission

Changing the BPF angle lights up

a random subset of pixels on the CCD; red, green and blue conceptually correspond to positions on the monolayer TMD that emits in differing energy ranges. When no filter is present, all energies are picked up.
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Makeup of PUF The BPF angular orientation θ, the corresponding BPF

Makeup of PUF

The BPF angular orientation θ, the corresponding BPF bandwidth, and

the spatially varying photoluminescence of the monolayer TMD PL makes up the physical unclonable function.
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Results for WS2 from mechanically exfoliation 50× Optical image of the

Results for WS2 from mechanically exfoliation

50× Optical image of the exfoliated  flake

on PDMS. μ-PL map of this flake was recorded with 532 nm excitation and 100 μW excitation power at 300 K. The integration time for each pixel is 0.5 s. 
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Results for WS2 from chemical vapor deposition Angular-dependent PL images of

Results for WS2 from chemical vapor deposition

Angular-dependent PL images of  monolayer flake,

excited by 450 nm laser, collected using 50×  (a)–(c) and 10×  (d)–(f) respectively.
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Angular dependent PL images of WS2 monolayer flake, excited by 450

Angular dependent PL images of WS2 monolayer flake, excited by 450 nm

laser, imaged by a 10×  objective lens