Titanium nitride magnetron sputtering

Слайд 2

Preparation Beam tube cleaned according to UHV practices. Vacuum fired at

Preparation

Beam tube cleaned according to UHV practices.
Vacuum fired at 450 C.
Assembled

into
coating system.

Two Fermilab 6” OD tubes in process.

Слайд 3

Coating System 3

Coating System

3

Слайд 4

Coating System Overview of system with two Fermilab tubes. Gas introduction flange. Power and cooling connections.

Coating System

Overview of system with
two Fermilab tubes.

Gas introduction flange.

Power and

cooling connections.
Слайд 5

Titanium Cathode Assembly Insertion of magnet string into Ti cathode.

Titanium Cathode Assembly
Insertion of magnet string into Ti cathode.

Слайд 6

The Coating Process Balance temperature, pressure, flow rate, and voltage to

The Coating Process

Balance temperature, pressure, flow rate, and voltage to control

deposition.
Start with Argon only for pure Ti layer, then add Nitrogen.
Monitor voltage discharge characteristics, plasma color, and partial pressures on RGA to confirm process.
The Fermilab setup started at 200 C and 4 e-7 Torr and took less than an hour.
Balance tempe
Vacuum fired at 450 C.
Assembled into
coating system.

Argon plasma

Argon + Nitrogen plasma

Слайд 7

System Disassembly Nitrogen insertion tube attached to titanium cathode still inside

System Disassembly

Nitrogen insertion tube attached to titanium cathode still inside chamber.

Titanium

cathode with nitrogen distribution tube. Magnet string position indicated by discoloration.
Слайд 8

Coating Complete Coating analysis coupons were inserted adjacent to production tubes. Finished Fermilab tube.

Coating Complete

Coating analysis coupons were inserted
adjacent to production tubes.

Finished Fermilab

tube.
Слайд 9

Installed in Main Injector One coated tube installed during Summer 2009

Installed in Main Injector

One coated tube installed during Summer 2009 shutdown

at MI-521.
One uncoated tube also installed, with electron cloud detectors on both.